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Home > PRODUCTS > Ion Beam SourceIon Beam Source
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We provide Ion-technology(ION TECH) for coating.
DC ion beam source types are End-Hall type and Linear type.
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End-Hall type
Ion Beam Source (End-Hall type)
Ion Assisted Deposition (IAD) has become well established as a means of improving optical performance, such as durability, stability with humidity and temperature, and better stoichiometry and reducing cost and defects.
Univac DC Ion Beam Source (End-hall type) can be operated during the deposition process to provide beneficial effects in thin film nucleation and packing density.
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Power supply
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lon Beam Source Controller
Benefits
Increased film adhesion and density.
Control of film stoichiometry.
Higher index of refraction.
Low film absorption and scatter.
Smooth film interfaces.
Hard film abrasion resistant films.
Control of film stress.
Substrate surface activation.
Low temperature processing
| Specifications | |
|---|---|
| Division | Data |
| Anode Voltage | 0 ~ 300V |
| Ion energy | 200eV |
| Ion wdistribution angle | 60˚ |
| Filament diameter | 0.375, 0.6mm |
| Filament current | 0 ~ 30A |
| Filament material | Tungsten |
| Anode cooling water flow | Not less than 2ℓ/min |
| Anode current | 0 ~ 9A |
| Recommended gas flow | 10 ~ 30sccm |
| Dimension | 139mm(D)*264mm(H) |
| Input voltage | AC220V |
Characteristic graph for Ion Beam Source
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Operation Image of Ion Beam Source
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