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Home > PRODUCTS > Electron Beam SourceElectron Beam Source
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We provide Electron Beam Source.
Electron Beam Source is used producing optical multilayer film.
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Univac electron beam gun applies an electron beam vertically onto the evaporant surface by electric and magnetic field.
The gun provides uniform energy distribution, making it ideally suited for deposition of oxides as well as sublimation material. And this gun holds multiple crucibles, it is used as a general purpose electron beam gun for producing optical multi-layer films.
Features
Directly heats evaporation materials, thus assuring you of high thermal efficiency and enabling high-melting-point metals such as W, Ta, and Mo and oxides to be evaporated.
Employs a water-cooled copper crucible which, unlike resistance heating, does not cause evaporation material to react with the heater, thus allowing high-purity optical thin films to be produced.
Uses a tungsten filament as the electron-beam source.
Its running costs are very low compared to resistance heating.
| Specifications | ||
|---|---|---|
| Division | Data | |
| Input power | 3-phase 220V(±10%) | |
| 60Hz | ||
| Sine wave | ||
| Output | Accelerating Voltage: 4kV ~10kV | |
| Emission current: 0~ 1.0A | ||
| Maximum output: 10kW | ||
| Deflection | 180 | |
| Scan Frequency | X-SCAN :50Hz | |
| Y-SCAN :50Hz | ||
| Controller : 1EA | ||
| EBG power supply: 1EA | ||
| Gun (180˚) | ||
| Component | Cable | E1, E2 Cable : 1EA |
| HV Cable : 2EA | ||
| Sweep Cable : 1EA | ||
| Ground wire | ||
Various Electron Beam Module and Crucibles (6, 8, 12, 24 pockets)
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